English   español  
Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/131452
Compartir / Impacto:
Estadísticas
Add this article to your Mendeley library MendeleyBASE
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Título

Sub-10 nm resistless nanolithography for directed self-assembly of block copolymers

AutorFernández-Regúlez, Marta; Evangelio, Laura; Lorenzoni, Matteo; Fraxedas, J. ; Pérez Murano, Francesc
Palabras claveAtomic force microscopy
Chemical guiding patterns
Block copolymer self-assembly
Fecha de publicación2014
EditorAmerican Chemical Society
CitaciónACS Applied Materials and Interfaces 6(23): 21596-21602 (2014)
ResumenThe creation of highly efficient guiding patterns for the directed self-Assembly of block copolymers by resistless nanolithography using atomic force microscopy (AFM) is demonstrated. It is shown that chemical patterns consisting of arrays of lines defined on a brush layer by AFM allow the alignment of the blocks of lamella-forming polymers. The main advantage of this method relies on the capability to create high-resolution (sub-10 nm line-width) guiding patterns and the reduction of the number of process steps compared to the state-of-the-Art methods for creating guiding patterns by chemical surface modification. It is found that the guiding patterns induce the block alignment very efficiently, allowing the achievement of a density multiplication factor of 7 for block copolymers of 14 nm half-pitch, which is attributed to the combined effect of topographical and chemical modification.
URIhttp://hdl.handle.net/10261/131452
DOI10.1021/am506600m
Identificadoresdoi: 10.1021/am506600m
e-issn: 1944-8252
issn: 1944-8244
Aparece en las colecciones: (IMB-CNM) Artículos
(CIN2) Artículos
Ficheros en este ítem:
Fichero Descripción Tamaño Formato  
accesoRestringido.pdf15,38 kBAdobe PDFVista previa
Visualizar/Abrir
Mostrar el registro completo
 

Artículos relacionados:


NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.