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Cell adhesion on ti surface with controlled roughness

AutorBurgos-Asperilla, Laura CSIC; García-Alonso, M. C. CSIC ORCID ; Escudero Rincón, María Lorenza; Alonso, C. CSIC ORCID
Fecha de publicación2015
EditorConsejo Superior de Investigaciones Científicas (España)
CitaciónRevista de Metalurgia 51(2): e044 (2015)
Resumen© 2015 CSIC. In this report, the in situ interaction between Saos-2 osteoblast cells and a smooth Ti surface was examined over time. The adhesion kinetics and mechanisms of cellular proliferation were monitored by quartz crystal microbalance (QCM) and electrochemical impedance spectroscopy (EIS). The rate of Saos-2 attachment on Ti surfaces, obtained from the measurements performed with the QCM, is a first-order reaction, with k=2.103 min1. The impedance measurements indicate that in the absence of cells, the Ti resistance diminishes over time (7 days), due to the presence of amino acids and proteins from the culture medium that have been a dsorbed, while in the presence of osteoblasts, this decrease is much greater because of the compounds generated by the cells that accelerate the dissolution of Ti.
Versión del editorhttp://dx.doi.org/10.3989/revmetalm.044
URIhttp://hdl.handle.net/10261/122331
DOI10.3989/revmetalm.044
Identificadoresdoi: 10.3989/revmetalm.044
issn: 1988-4222
Aparece en las colecciones: (CENIM) Artículos




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