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Magnetic properties of Co-N thin films deposited by reactive sputtering

AuthorsSilva, C.; Vovk, A.; Strichovanec, Pavel; Algarabel, Pedro A.
Thin films
Reactive sputtering
Cobalt nitrides
Issue Date2014
CitationThin Solid Films 556: 125-127 (2014)
AbstractCo-N thin films with thickness of 80 nm were deposited using direct current magnetron sputtering at different N2 partial pressures (PP). The composition, structure and magnetic properties were characterized using Rutherford Backscattering Spectrometry, X-ray Diffraction, Atomic Force Microscopy and Magnetometry. The magnetic properties vary with the nitrogen content of the film, determined by the N2 PP used for deposition, and are correlated with the cobalt content of the film. The magnetic phases Co 4 + xN and Co3N were identified as responsible for the variation of the magnetization values. © 2014 Elsevier B.V.
Descriptionet al.
Identifiersdoi: 10.1016/j.tsf.2014.01.019
issn: 0040-6090
Appears in Collections:(ICMA) Artículos
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