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Título: | Photochemical generation of light responsive surfaces |
Autor: | Blasco, Eva CSIC ORCID; Piñol, Milagros CSIC ORCID; Oriol, Luis CSIC ORCID; Barner-Kowollik, Christopher | Palabras clave: | Azobenzene Surface patterning Photoligation chemistry Grafting Photoresponse |
Fecha de publicación: | 2013 | Editor: | Wiley-VCH | Citación: | Advanced Functional Materials 23(32): 4011-4019 (2013) | Resumen: | The preparation of patterned photoswitchable surfaces by employing the nitrile imine-mediated tetrazole ene cycloaddition (NITEC) photoinduced reaction in the presence of dipolarophiles based on photoresponsive azobenzene moieties is reported. The dipolarophile used is a maleimide carrying either an azobenzene unit or a first generation dendron containing two azobenzene units. X-ray photoelectron spectroscopy (XPS) is employed to analyze the functionalized silicon wafers, while time-of-flight secondary ion mass spectrometry (ToF-SIMS) evidences the spatial control of the functionalization of the surface achieved by using a micropatterned shadow mask. Water contact angle measurements and optical inspection observing the behavior of a water droplet demonstrate the photoinduced change on wettability of the structured functionalized surfaces due to the reversible trans-to-cis isomerization of the azobenzene moities. Patterned photoswitchable surfaces are prepared by employing a nitrile imine-mediated tetrazole ene cycloaddition (NITEC) photoinduced process in the presence of dipolarophiles based on photoresponsive azobenzene moieties. | URI: | http://hdl.handle.net/10261/117732 | DOI: | 10.1002/adfm.201203602 | Identificadores: | doi: 10.1002/adfm.201203602 issn: 1616-301X e-issn: 1616-3028 |
Aparece en las colecciones: | (ICMA) Artículos |
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