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Photochemical generation of light responsive surfaces

AutorBlasco, Eva; Piñol, Milagros; Oriol, Luis; Barner-Kowollik, Christopher
Palabras claveAzobenzene
Surface patterning
Photoligation chemistry
Fecha de publicación2013
CitaciónAdvanced Functional Materials 23(32): 4011-4019 (2013)
ResumenThe preparation of patterned photoswitchable surfaces by employing the nitrile imine-mediated tetrazole ene cycloaddition (NITEC) photoinduced reaction in the presence of dipolarophiles based on photoresponsive azobenzene moieties is reported. The dipolarophile used is a maleimide carrying either an azobenzene unit or a first generation dendron containing two azobenzene units. X-ray photoelectron spectroscopy (XPS) is employed to analyze the functionalized silicon wafers, while time-of-flight secondary ion mass spectrometry (ToF-SIMS) evidences the spatial control of the functionalization of the surface achieved by using a micropatterned shadow mask. Water contact angle measurements and optical inspection observing the behavior of a water droplet demonstrate the photoinduced change on wettability of the structured functionalized surfaces due to the reversible trans-to-cis isomerization of the azobenzene moities. Patterned photoswitchable surfaces are prepared by employing a nitrile imine-mediated tetrazole ene cycloaddition (NITEC) photoinduced process in the presence of dipolarophiles based on photoresponsive azobenzene moieties.
Identificadoresdoi: 10.1002/adfm.201203602
issn: 1616-301X
e-issn: 1616-3028
Aparece en las colecciones: (ICMA) Artículos
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