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Título

Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering

Autor Martínez-Martínez, D. ; López-Cartes, C.; Fernández-Camacho, A. ; Sánchez-López, J.C.
Palabras clave TiN
Target
Magnetron sputtering
XRD
Stress
Hardness
Fecha de publicación 2013
EditorElsevier
Citación Applied Surface Science, 275: 121-126 (2013)
ResumenThe aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a −100 V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wear-resistant TiN films.
Versión del editorhttp://dx.doi.org/10.1016/j.apsusc.2013.01.098
URI http://hdl.handle.net/10261/114595
DOI10.1016/j.apsusc.2013.01.098
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