2024-03-28T23:56:58Zhttp://digital.csic.es/dspace-oai/requestoai:digital.csic.es:10261/48872021-03-26T10:54:30Zcom_10261_4872com_10261_4col_10261_4873
Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography
García García, Nicolás
Cheng, Hao
Lu, Yonhua
Muñoz, Manuel
Yifang, Chen
Zhengqi, Lu
Yun, Zhou
Genhua, Pan
Zheng, Cui
Pasa, A. A.
European Commission
Metallic thin films
Magnetoresistance
Permalloy
Nanocontacts
Electron beam lithography
15 pages, 4 figures. Accepted by APL.-- Final full-text version published 24 Aug 2006, available at: http://dx.doi.org/10.1063/1.2337538
In this paper we show spin dependent transport experiments in nanoconstrictions ranging from 30 to 200nm. These nanoconstrictions were fabricated combining electron beam lithography and thin film deposition techniques. Two types of geometries have been fabricated and investigated. We compare the experimental results with the theoretical estimation of the electrical resistance. Finally we show that the magnetoresistance for the different geometries does not scale with the resistance of the structure and obtain drops in voltage of 20mV at 20 Oe.
2008-06-09T07:47:26Z
2008-06-09T07:47:26Z
2006-07-24
preprint
arXiv:cond-mat/0607608v1 [cond-mat.mtrl-sci]
0003-6951
http://hdl.handle.net/10261/4887
10.1063/1.2337538
http://dx.doi.org/10.13039/501100000780
eng
Preprint
openAccess
American Institute of Physics