2024-03-29T10:31:08Zhttp://digital.csic.es/dspace-oai/requestoai:digital.csic.es:10261/28172016-02-16T02:18:57Zcom_10261_36com_10261_4col_10261_289
Development of a parallel local oxidation nanolithography instrument
Martínez Rodríguez, Luis Javier
Sánchez Losilla, Nuria
Biscarini, Fabio
Schmidt, Georg
Borzenko, Tanja
Molenkamp, Laurens W.
García García, Ricardo
We have developed an instrument to perform local oxidation nanofabrication processes in parallel. The instrument has three major components, the stamp holder, the sample base, and the supporting frame. The sample base is actuated by three precision screws that enable motion in the three orthogonal directions. Sample base and stamp holder are enclosed and sealed inside a chamber with two inlets to introduce different gases. The chamber is supported by a rigid frame. We show the parallel patterning of silicon oxide features on silicon surfaces by the application of a bias voltage
between the sample and the stamp when they are in contact. Arrays of parallel lines separated by 100 nm have been patterned over cm2 regions in one minute.
2008-01-31T18:33:37Z
2008-01-31T18:33:37Z
2006-08-22
artículo
Review of Scientific Instruments 77, 086106 2006
0034-6748
http://hdl.handle.net/10261/2817
10.1063/1.2336773
eng
openAccess
American Institute of Physics