2024-03-28T20:07:48Zhttp://digital.csic.es/dspace-oai/requestoai:digital.csic.es:10261/209852021-07-22T08:20:54Zcom_10261_89com_10261_3col_10261_342
X-ray photoelectron spectroscopy study of low-temperature molybdenum oxidation process
Castañeda, S. I.
Montero, Isabel
Ripalda, José María
Díaz, N.
Galán, L.
Rueda, Fernando
4 pages, 5 figures.
The low-temperature oxidation during deposition by evaporation of molybdenum thin films has
been investigated. Analysis by x-ray photoelectron spectroscopy and x-ray diffraction reveals that
small differences in the substrate temperature during deposition may give rise to important changes
in the final composition and structure of the molybdenum oxide. Changes in binding energy and line
shape of the Mo 3d5/22Mo 3d3/2 doublet attributed to oxygen incorporation have been studied. Two
principal steps can be distinguished, with a transition temperature of ;310 °C. Up to substrate
temperatures of ;310 °C, the superficial Mo remains almost unaffected, with some oxygen
dissolved. At ;310 °C, mixing of Mo0 metal and molybdenum oxide (Mod10,d,4) clusters or
islands is observed. Finally, above this temperature a surface layer of molybdenum oxide, Mo61, is
formed. In addition, an abrupt change in d100 interplanar parameter of Mo is observed.
2010-02-12T10:29:57Z
2010-02-12T10:29:57Z
1999-06-15
artículo
Journal of Applied Physics 85(12): 8415 (1999)
0021-8979
http://hdl.handle.net/10261/20985
10.1063/1.370690
eng
http://dx.doi.org/10.1063/1.370690
openAccess
American Institute of Physics