2024-03-28T09:42:57Zhttp://digital.csic.es/dspace-oai/requestoai:digital.csic.es:10261/179312019-06-13T11:58:32Zcom_10261_36com_10261_4col_10261_289
Enhanced compositional sensitivity in atomic force microscopy by the excitation of the first two flexural modes
Martínez Cuadrado, Nicolás Francisco
Patil, Shivprasad
Lozano, José R.
García García, Ricardo
Atomic force microscopy
Silicon
Elemental semiconductors
Vibrational modes
Surface topography
The authors demonstrate that the compositional sensitivity of an atomic force microscope is enhanced by the simultaneous excitation of its first two flexural eigenmodes. The coupling of those modes by the nonlinear probe-surface interactions enables to map compositional changes in several conjugated molecular materials with a phase shift sensitivity that is about one order of magnitude higher than the one achieved in amplitude modulation atomic force microscopy.
The authors thank Fabio Biscarini, Neil Oxtoby, and Concepció Rovira for providing the conjugated molecules. This work was financially supported by the European Commission (FORCETOOL, NMP4-CT-2004-013684).
Peer reviewed
2009-10-22T10:50:17Z
2009-10-22T10:50:17Z
2006-10-11
artículo
http://purl.org/coar/resource_type/c_6501
Applied Physic Letters 89, 153115 (2006)
0003-6951
http://hdl.handle.net/10261/17931
10.1063/1.2360894
en
http://link.aip.org
http://dx.doi.org/10.1063/1.2360894
open
374622 bytes
application/pdf
American Institute of Physics