2024-03-29T06:48:11Zhttp://digital.csic.es/dspace-oai/requestoai:digital.csic.es:10261/625332022-09-08T11:47:12Zcom_10261_89com_10261_3col_10261_342
00925njm 22002777a 4500
dc
Vázquez, Luis
author
Salvarezza, R. C.
author
Albano, E.
author
Arvia, A. J.
author
Hernández Creus, Alberto
author
Levy, Roi
author
Albella, J. M.
author
1998
Communication: CVD tungsten films have many technological applications, and for most cases it is desirable to control the film surface structure. Several growth models have been proposed, but predictions have been difficult to check due to lack of systematic experiments. This work gives results for dynamics of LPCVD tungsten surfaces and makes a comparison with predicted behavior. A scanning tunneling microscopy image of a rough film is shown.
Chemical Vapor Deposition 4(3): 89-91 (1998)
http://hdl.handle.net/10261/62533
10.1002/(SICI)1521-3862(199805)04:03<89::AID-CVDE89>3.0.CO;2-9
Surface morphology evolution of chemical vapor-deposited tungsten films on Si(100)