2024-03-29T05:35:53Zhttp://digital.csic.es/dspace-oai/requestoai:digital.csic.es:10261/1337922021-12-27T15:50:19Zcom_10261_36com_10261_4col_10261_289
00925njm 22002777a 4500
dc
Gigler, Alexander M.
author
Dietz, Christian
author
Baumann, Maximilian
author
Martínez Cuadrado, Nicolás Francisco
author
García García, Ricardo
author
Stark, R. W.
author
2012-06-30
Bimodal atomic force microscopy can provide high-resolution images of polymers. In the bimodal operation mode, two eigenmodes of the cantilever are driven simultaneously. When examining polymers, an effective mechanical contact is often required between the tip and the sample to obtain compositional contrast, so particular emphasis was placed on the repulsive regime of dynamic force microscopy. We thus investigated bimodal imaging on a polystyrene-block-polybutadiene diblock copolymer surface and on polystyrene. The attractive operation regime was only stable when the amplitude of the second eigenmode was kept small compared to the amplitude of the fundamental mode. To clarify the influence of the higher eigenmode oscillation on the image quality, the amplitude ratio of both modes was systematically varied. Fourier analysis of the time series recorded during imaging showed frequency mixing. However, these spurious signals were at least two orders of magnitude smaller than the first two fundamental eigenmodes. Thus, repulsive bimodal imaging of polymer surfaces yields a good signal quality for amplitude ratios smaller than A 01/A 02 = 10:1 without affecting the topography feedback. © 2012 Gigler et al; licensee Beilstein-Institut.
Beilstein Journal of Nanotechnology 3: 456- 463 (2012)
http://hdl.handle.net/10261/133792
10.3762/bjnano.3.52
http://dx.doi.org/10.13039/501100000780
23016150
Bimodal AFM imaging
Polystyrene
Polybutadiene
Diblock copolymer
Repulsive bimodal atomic force microscopy on polymers