2024-03-29T00:44:36Zhttp://digital.csic.es/dspace-oai/requestoai:digital.csic.es:10261/26622018-08-01T12:34:30Zcom_10261_89com_10261_3com_10261_93com_10261_4col_10261_342col_10261_346
2008-01-09T16:02:32Z
urn:hdl:10261/2662
Low Pressure PECVD of Nanoparticles in carbon thin films from low pressure radiofrequency Ar/H2/C2H2 plasmas. Synthesis of films and analysis of the electron energy distribution function
Camero, Manuel
Gordillo Vázquez, Francisco J.
Gómez-Aleixandre, C.
Carbon nanoparticles
C2H2
OES
Plasma EEDF
RF-CVD
[Full-text paper not available yet]
A study of the synthesis of carbon nanoparticles embedded in carbon thin films deposited by radiofrequency (RF) (13.56 MHz) Ar/H2 (4 %)/C2H2 plasmas is presented. The carbon nanospheres exhibit an amorphous structure that is clearly observed at 300 W, under 0.1 Torr, and grows in size with increasing C2H2 between 1% and 20 %. Above a C2H2 concentration threshold (20% in this case) carbon nanoparticles are no longer formed. In order to study possible changes in the plasma kinetics, optical emission spectroscopy (OES) is used to evaluate the electron temperature while changing the C2H2 concentration. In addition, an analysis of the temporal evolution of the electron energy distribution function (EEDF) is carried out for various C2H2 concentrations considering the effects produced by electron-vibrational superelastic collisions and relative
concentration of excited Ar atoms. Finally, the morphological and tribological features of the deposited films are characterized.
2008-01-09T16:02:32Z
2008-01-09T16:02:32Z
2007
artículo
Chemical Vapor Deposition, 13 (2007): 326-334.
0948-1907
http://hdl.handle.net/10261/2662
10.1002/cvde.200606554
eng
closedAccess
John Wiley & Sons