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Navegación por Autor Dago, Arancha I.
Mostrando resultados 1 a 6 de 6
Derechos | Preview | Fecha Public. | Título | Autor(es) | Tipo |
openAccess | | abr-2018 | Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography | Dago, Arancha I.; Sangiao, S. CSIC ORCID; Fernández-Pacheco, Rodrigo; Teresa, José María de CSIC ORCID ; García García, Ricardo CSIC ORCID | artículo |
closedAccess | | 2018 | Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography | Dago, Arancha I.; Sangiao, S. CSIC ORCID; Fernández-Pacheco, Rodrigo; Teresa, José María de CSIC ORCID ; García García, Ricardo CSIC ORCID | comunicación de congreso |
openAccess | | 12-nov-2018 | Direct Patterning of p-Type-Doped Few-layer WSe2 Nanoelectronic Devices by Oxidation Scanning Probe Lithography | Dago, Arancha I.; Ryu, Y. K. CSIC ORCID; Palomares, F. Javier CSIC ORCID; García García, Ricardo CSIC ORCID | artículo |
openAccess | | 21-oct-2020 | Sub-10 nm patterning of few-layer MoS2 and MoSe2 nanolectronic devices by oxidation scanning probe lithography | Ryu, Y. K. CSIC ORCID; Dago, Arancha I.; He, Y.; Espinosa, Francisco M. CSIC ORCID; López-Elvira, Elena ; Munuera, C. CSIC ORCID ; García García, Ricardo CSIC ORCID | artículo |
openAccess | | sep-2016 | Sub-20 nm patterning of thin layer WSe2 by scanning probe lithography | Dago, Arancha I.; Ryu, Y. K. CSIC ORCID; García García, Ricardo CSIC ORCID | póster de congreso |
openAccess | | 20-oct-2016 | Sub-20 nm patterning of thin layer WSe2 by scanning probe lithography | Dago, Arancha I.; Ryu, Y. K. CSIC ORCID; García García, Ricardo CSIC ORCID | artículo |