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Navegación por Autor Gosálvez, M. A.

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Mostrando resultados 17 a 31 de 31 < Anterior 
DerechosPreviewFecha Public.TítuloAutor(es)Tipo
closedAccessaccesoRestringido.pdf.jpg2013Implementation and evaluation of the Level Set method: Towards efficient and accurate simulation of wet etching for microengineering applicationsMontoliu, Carles CSIC; Ferrando, Néstor CSIC ORCID CVN; Gosálvez, M. A. CSIC ORCID; Cerdá, Joaquín CSIC; Colóm, R. J.artículo
closedAccessaccesoRestringido.pdf.jpg2017Kinetic Monte Carlo method for the simulation of anisotropic wet etching of quartzZhang, Hui; Xing, Yan; Li, Yuan; Gosálvez, M. A. CSIC ORCID; Qiu, Xiaoliartículo
closedAccessaccesoRestringido.pdf.jpg2013Level set implementation for the simulation of anisotropic etching: Application to complex MEMS micromachiningMontoliu, Carles CSIC; Ferrando, Néstor CSIC ORCID CVN; Gosálvez, M. A. CSIC ORCID; Cerdá, Joaquín CSIC; Colóm, R. J.artículo
openAccesslowhop.pdf.jpg2016Low-coverage surface diffusion in complex periodic energy landscapes. II. Analytical solution for systems with asymmetric hopsGosálvez, M. A. CSIC ORCID; Otrokov, M. M. CSIC ORCID; Ferrando, Néstor CSIC ORCID CVN; Ryabishchenkova, A. G.; Ayuela, Andrés CSIC ORCID; Echenique, Pedro M. CSIC ORCID; Chulkov, Eugene V. CSIC ORCIDartículo
openAccesslowinsula.pdf.jpg2016Low-coverage surface diffusion in complex periodic energy landscapes: Analytical solution for systems with symmetric hops and application to intercalation in topological insulatorsGosálvez, M. A. CSIC ORCID; Otrokov, M. M. CSIC ORCID; Ferrando, Néstor CSIC ORCID CVN; Ryabishchenkova, A. G.; Ayuela, Andrés CSIC ORCID; Echenique, Pedro M. CSIC ORCID; Chulkov, Eugene V. CSIC ORCIDartículo
closedAccessaccesoRestringido.pdf.jpg2017Microscopic origin of the apparent activation energy in diffusion-mediated monolayer growth of two-dimensional materialsGosálvez, M. A. CSIC ORCID; Alberdi-Rodríguez, Joseba CSIC ORCIDartículo
closedAccessaccesoRestringido.pdf.jpg2020Multiscale analysis of phase transformations in self-assembled layers of 4,4′-biphenyl dicarboxylic acid on the Ag(001) surfaceProcházka, Pavel; Gosálvez, M. A. CSIC ORCID; Kormoš, L.; Torre, Bruno de la; Gallardo, Aurelio; Alberdi-Rodríguez, Joseba CSIC ORCID; Chutora, Taras; Makoveev, Anton O.; Shahsavar, Azin; Arnau, Andrés CSIC ORCID; Jelinek, Pavel; Čechal, Janartículo
openAccessOctree-based,GPU.pdf.jpgmar-2011Octree-based, GPU implementation of a continuous cellular automaton for the simulation of complex, evolving surfacesFerrando, Néstor CSIC ORCID CVN; Gosálvez, M. A. CSIC ORCIDartículo
closedAccessaccesoRestringido.pdf.jpg2015Particle swarm optimization-based continuous cellular automaton for the simulation of deep reactive ion etchingLi, Yuan; Gosálvez, M. A. CSIC ORCID; Pal, Prem; Sato, K.; Xing, Yanartículo
closedAccessaccesoRestringido.pdf.jpg2011Reconstructing the 3D etch rate distribution of silicon in anisotropic etchants using data from vicinal {100}, {110} and {111} surfacesGosálvez, M. A. CSIC ORCID; Pal, Prem; Sato, K.artículo
closedAccessdic-2011Reliability assessment of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samplesGosálvez, M. A. CSIC ORCID; Pal, Prem; Ferrando, Néstor CSIC ORCID CVN; Sato, K.artículo
closedAccessaccesoRestringido.pdf.jpg2015Removal probability function for Kinetic Monte Carlo simulations of anisotropic etching of silicon in alkaline etchants containing additivesZhang, Hui; Gosálvez, M. A. CSIC ORCID; Pal, Prem; Sato, K.artículo
closedAccessjun-2011Simulating anisotropic etching of silicon in any etchant: evolutionary algorithm for the calibration of the continuous cellular automatonGosálvez, M. A. CSIC ORCID; Ferrando, Néstor CSIC ORCID CVNartículo
closedAccessaccesoRestringido.pdf.jpg2018The maximum positive curvature recognition method to determine etch profiles in wet etching of quartz on AT and BT cutsXing, Yan; Zhang, Jing; Gosálvez, M. A. CSIC ORCID; Zhang, Hui; Li, Yuan; Zhou, Songhuaartículo
closedAccessaccesoRestringido.pdf.jpg2017Transient and stable profiles during anisotropic wet etching of quartzXing, Yan; Gosálvez, M. A. CSIC ORCID; Zhang, Hui; Li, Yuan; Qiu, Xiaoliartículo