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dc.contributor.authorRomero-Gómez, Pablo-
dc.contributor.authorPalmero, Alberto-
dc.contributor.authorYubero, Francisco-
dc.contributor.authorVinnichenko, M.-
dc.contributor.authorKolitsch, A.-
dc.contributor.authorGonzález-Elipe, Agustín R.-
dc.date.accessioned2014-06-04T08:20:45Z-
dc.date.available2014-06-04T08:20:45Z-
dc.date.issued2009-
dc.identifierdoi: 10.1016/j.scriptamat.2008.12.014-
dc.identifierissn: 1359-6462-
dc.identifier.citationScripta Materialia 60: 574- 577 (2009)-
dc.identifier.urihttp://hdl.handle.net/10261/97686-
dc.description.abstractThis work reports a procedure to modify the surface nanostructure of TiO2 anatase thin films through ion beam irradiation with energies in the keV range. Irradiation with N+ ions leads to the formation of a layer with voids at a depth similar to the ion-projected range. By setting the ion-projected range a few tens of nanometers below the surface of the film, well-ordered nanorods appear aligned with the angle of incidence of the ion beam. Slightly different results were obtained by using heavier (S+) and lighter (B+) ions under similar conditions. © 2008 Acta Materialia Inc.-
dc.publisherPergamon Press-
dc.rightsopenAccess-
dc.subjectSurface structure-
dc.subjectIon beam irradiation-
dc.subjectNanostructure-
dc.titleSurface nanostructuring of TiO2 thin films by ion beam irradiation-
dc.typeArtículo-
dc.identifier.doi10.1016/j.scriptamat.2008.12.014-
dc.date.updated2014-06-04T08:20:45Z-
dc.description.versionPeer Reviewed-
dc.language.rfc3066eng-
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