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dc.contributor.authorGil-Rostra, J.-
dc.contributor.authorChaboy, Jesús-
dc.contributor.authorYubero, Francisco-
dc.contributor.authorVilajoana, Antoni-
dc.contributor.authorGonzález-Elipe, Agustín R.-
dc.date.accessioned2014-04-30T09:02:44Z-
dc.date.available2014-04-30T09:02:44Z-
dc.date.issued2013-
dc.identifierdoi: 10.1021/am302778h-
dc.identifierissn: 1944-8244-
dc.identifier.citationACS Applied Materials and Interfaces 5(6): 1967-1976 (2013)-
dc.identifier.urihttp://hdl.handle.net/10261/96074-
dc.description.abstractThis work describes the reactive magnetron sputtering processing at room temperature of several mixed oxide MxSiyOz thin films (M: Fe, Ni, Co, Mo, W, Cu) intended for optical, coloring, and aesthetic applications. Specific colors can be selected by adjusting the plasma gas composition and the Si-M ratio in the magnetron target. The microstructure and chemistry of the films are characterized by a large variety of techniques including X-ray photoemission spectroscopy, X-ray absorption spectroscopy (XAS), and infrared spectroscopy, while their optical properties are characterized by UV-vis transmission and reflection analysis. Particularly, XAS analysis of the M cations in the amorphous thin films has provided valuable information about their chemical state and local structure. It is concluded that the M cations are randomly distributed within the SiO2 matrix and that both the M concentration and its chemical state are the key parameters to control the final color of the films. © 2013 American Chemical Society.-
dc.description.sponsorshipWe thank the Junta de Andalucía (Projects P09-CTS-5189, TEP5283, and FQM-6900), the Ministry of Science and Innovation (Projects CENIT-ArtDeco, CONSOLIDER CSD2008-00023, MAT2010-21228, MAT2010-18447, MAT2008-06542-C04-01, MAT2011-27573-C04-04), and DGA NETOSHIMA grants for financial support. We acknowledge MICINN and CSIC for provision of synchrotron radiation facilities at the ESRF and the BM25-Spline staff for the technical support.-
dc.rightsclosedAccess-
dc.titleColored and transparent oxide thin films prepared by magnetron sputtering: The glass blower approach-
dc.typeArtículo-
dc.identifier.doi10.1021/am302778h-
dc.date.updated2014-04-30T09:02:44Z-
dc.description.versionPeer Reviewed-
dc.language.rfc3066eng-
dc.contributor.funderJunta de Andalucía-
dc.contributor.funderMinisterio de Ciencia e Innovación (España)-
dc.contributor.funderGobierno de Aragón-
dc.contributor.funderConsejo Superior de Investigaciones Científicas (España)-
dc.relation.csic-
dc.identifier.funderhttp://dx.doi.org/10.13039/501100004837es_ES
dc.identifier.funderhttp://dx.doi.org/10.13039/501100003339es_ES
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