Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/7708
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Título : Novel methods to pattern polymers for microfluidics
Autor : Martín, C., Llobera, Andreu, Leïchlé, T., Villanueva, G., Voigt, A., Fakhfouri, V., Kim, J.Y., Berthet, N., Bausells, J., Gruetzner, G., Nicu, L., Bruegger, Juergen, Pérez Murano, Francesc
Palabras clave : Liquid spotter
Microfluidics
Hydrophobic barriers
Soft-lithography
Ink-jet
Fecha de publicación : 10-Jan-2008
Editor: Elsevier
Citación : Microelectronic Engineering 85 (2008) 972-975
Resumen: We present two novel methods for the preparation of arbitrary micro-scale patterns of polymers on surfaces with pre-defined topography. While photosensitive polymers are used commonly together with optical lithography, the methods presented can be used for nonphotostructurable polymers and where spin-coating cannot be performed. As demonstrator of the viability of the proposed fabrication process, they have been applied for the definition of hydrophobic barriers on a microfluidics network, which is dedicated to selectively dispense liquid to a spotting device consisting of 12 silicon microcantilevers.
Versión del editor: http://dx.doi.org/10.1016/j.mee.2008.01.052
URI : http://hdl.handle.net/10261/7708
DOI: 10.1016/j.mee.2008.01.052
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