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Manufacturing of surface relief structures in moving substrates using photoembossing and pulsed-interference holography

AuthorsPicot, Olivier T.; Alcalá, Rafael; Sánchez-Somolinos, Carlos; Dai, Mian; Hughes-Brittain, Nanayaa F.; Broer, Dirk, J.; Peijs, Ton; Bastiaansen, Cees
Issue Date2013
CitationMacromolecular Materials and Engineering 298(1): 33-37 (2013)
AbstractPhotoembossing is a cost-effective technique for the production of complex surface relief structures in a photopolymer film, achieved via contact-mask exposure to UV-light. Here, photoembossing is explored using interference holography with a CW laser and a nanosecond pulsed laser. It is shown that identical surface relief structures are produced if the photopolymer film is kept in a fixed position. In the case of a moving substrate, relief structures are only obtained with the pulsed laser and the heights of the relief structures and their shape are the same as in the static experiments. This illustrates that photoembossing in combination with pulsed laser interference holography is potentially useful in the production of large area structured films using roll-to-roll processes.
Publisher version (URL)http://dx.doi.org/10.1002/mame.201100433
Identifiersdoi: 10.1002/mame.201100433
issn: 1438-7492
e-issn: 1439-2054
Appears in Collections:(ICMA) Artículos
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