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Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/62173
Title: ZnO inverse opals by chemical vapor deposition
Authors: Juárez, B. H.; García, Pedro David; Golmayo, Dolores; Blanco Montes, Álvaro; López, Cefe
Issue Date: 2005
Publisher: Wiley-VCH
Citation: Advanced Materials 17 (22): 2761-2765 (2005)
Abstract: Zinc oxide (ZnO) was grown in synthetic opals by using chemical vapor deposition (CVD) method. The CVD method yielded large area, high quality ZnO-polystyrene (PS) and ZnO inverse opals, with very precise control of degree of infiltration. ZnO was grown in thin PS opal films on silicon substrates, using a diluted solution of DMZn in hexane as zinc precursor. Double-distilled water (DDW) was used as a oxygen precursor. Inverse opals were obtained upon calcination of PS-ZnO composites at 450 degree C for 3 hours in air.
URI: http://hdl.handle.net/10261/62173
DOI: 10.1002/adma.200500569
Identifiers: doi: 10.1002/adma.200500569
issn: 0935-9648
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