Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/62173
Título : ZnO inverse opals by chemical vapor deposition
Autor : Juárez, B. H., García, Pedro David, Golmayo, Dolores, Blanco, Álvaro, López, Cefe
Fecha de publicación : 2005
Editor: Wiley-VCH
Resumen: Zinc oxide (ZnO) was grown in synthetic opals by using chemical vapor deposition (CVD) method. The CVD method yielded large area, high quality ZnO-polystyrene (PS) and ZnO inverse opals, with very precise control of degree of infiltration. ZnO was grown in thin PS opal films on silicon substrates, using a diluted solution of DMZn in hexane as zinc precursor. Double-distilled water (DDW) was used as a oxygen precursor. Inverse opals were obtained upon calcination of PS-ZnO composites at 450 degree C for 3 hours in air.
URI : http://hdl.handle.net/10261/62173
Identificadores: doi: 10.1002/adma.200500569
issn: 0935-9648
Citación : Advanced Materials 17 (22): 2761-2765 (2005)
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