DSpace

Digital.CSIC > Ciencia y Tecnología de Materiales > Instituto de Ciencia de Materiales de Madrid (ICMM) > (ICMM) Artículos >

Share

EndNote

Impact

Closed Access item ZnO inverse opals by chemical vapor deposition

Authors:Juárez, B. H.
García, Pedro David
Golmayo, Dolores
Blanco, A.
López, Cefe
Issue Date:2005
Publisher:Wiley-VCH
Citation:Advanced Materials 17 (22): 2761-2765 (2005)
Abstract:Zinc oxide (ZnO) was grown in synthetic opals by using chemical vapor deposition (CVD) method. The CVD method yielded large area, high quality ZnO-polystyrene (PS) and ZnO inverse opals, with very precise control of degree of infiltration. ZnO was grown in thin PS opal films on silicon substrates, using a diluted solution of DMZn in hexane as zinc precursor. Double-distilled water (DDW) was used as a oxygen precursor. Inverse opals were obtained upon calcination of PS-ZnO composites at 450 degree C for 3 hours in air.
URI:http://hdl.handle.net/10261/62173
Identifiers:doi: 10.1002/adma.200500569
issn: 0935-9648
Appears in Collections:(ICMM) Artículos

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.