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|Title:||ZnO inverse opals by chemical vapor deposition|
|Authors:||Juárez, B. H.; García, Pedro David; Golmayo, Dolores; Blanco, Álvaro; López, Cefe|
|Citation:||Advanced Materials 17 (22): 2761-2765 (2005)|
|Abstract:||Zinc oxide (ZnO) was grown in synthetic opals by using chemical vapor deposition (CVD) method. The CVD method yielded large area, high quality ZnO-polystyrene (PS) and ZnO inverse opals, with very precise control of degree of infiltration. ZnO was grown in thin PS opal films on silicon substrates, using a diluted solution of DMZn in hexane as zinc precursor. Double-distilled water (DDW) was used as a oxygen precursor. Inverse opals were obtained upon calcination of PS-ZnO composites at 450 degree C for 3 hours in air.|
|Appears in Collections:||(ICMM) Artículos|
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