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Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/57776
Title: Solidification phenomena in Ge films upon nano- and pico-second laser pulse melting
Authors: Afonso, Carmen N.; Solís Céspedes, Javier; Vega, F.; Siegel, Jan; Szyszko, W.
Issue Date: 1997
Publisher: Elsevier
Citation: Applied Surface Science 109-110: 20- 24 (1997)
Abstract: Melting has been induced in amorphous Ge films upon irradiation with both nano- and pico-second laser pulses. The role of undercooling and heat flow in the subsequent rapid solidification process has been investigated by analyzing the behavior of films with different thicknesses (30-180 nm) grown on Si(100) substrates by means of real time reflectivity measurements in the ns timescale. Recalescence is observed in films with a thickness above a threshold value which depends on the pulse duration. An additional solidification scenario, i.e. surface initiated solidification, is observed upon ps pulse irradiation in films with intermediate thicknesses.
URI: http://hdl.handle.net/10261/57776
DOI: 10.1016/S0169-4332(96)00614-9
Identifiers: doi: 10.1016/S0169-4332(96)00614-9
issn: 0169-4332
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