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A high-sensitivity in situ optical diagnostic technique for laser cleaning of transparent substrates

AuthorsChaoui, N.; Solís Céspedes, Javier ; Afonso, Carmen N. ; Fourrier, T.; Muehlberger, T.; Schrems, G.; Mosbacher, M.; Bäuerle, D.; Bertsch, M.; Leiderer, P.
Issue Date2003
CitationApplied Physics A: Materials Science and Processing 76: 767- 771 (2003)
AbstractA differential optical transmission technique has been used to monitor in situ the efficiency of laser cleaning for the removal of sub-micrometer-sized particles on substrates transparent at the monitoring wavelength. This technique has been applied to the removal of sub-micrometer polystyrene particles on polyimide substrates using laser pulses of 30 ps duration at 292 nm while probing the material transmission at 633 nm. The sensitivity achieved -1/104 for the transmission changes induced upon single-pulse laser exposure - allows us to monitor the removal of just a few sub-micron-sized particles from the probed region inside the irradiated area.
Identifiersdoi: 10.1007/s00339-002-2032-1
issn: 0947-8396
Appears in Collections:(CFMAC-IO) Artículos
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