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A comparison of ns and ps steam laser cleaning of Si surfaces

AuthorsMosbacher, M.; Chaoui, N.; Siegel, Jan ; Dobler, V.; Solís Céspedes, Javier ; Boneberg, J.; Afonso, Carmen N. ; Leiderer, P.
Issue Date1999
CitationApplied Physics A: Materials Science and Processing 69: S331- S334 (1999)
AbstractWe report a quantitative investigation on the efficiency of the steam laser cleaning process using ns and ps pulses. Well-characterized polymer particles with a diameter of 800 nm dispersed on commercial Si wafers were chosen as a modeling contaminant system. As a result of our investigation, we show for the first time the feasibility of performing efficient steam laser cleaning with ps laser pulses and compare the achieved efficiency with the one obtained for ns pulses. For ns pulses, we found a cleaning fluence threshold of 50 mJ/cm2 that is independent of the pulse durations (2.5 ns and 8 ns) and the wavelengths (532 nm and 583 nm) used. The application of ps pulses (FWHM = 30 ps, λ = 583 nm) lowered this threshold to 20 mJ/cm2. Both cleaning thresholds are far below the melting thresholds for these laser parameters. Cleaning efficiencies > 90% were reached for both pulse durations. © Springer-Verlag 1999.
Identifiersdoi: 10.1007/s003399900343
issn: 0947-8396
Appears in Collections:(CFMAC-IO) Artículos
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