English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/56593
Share/Impact:
Statistics
logo share SHARE logo core CORE   Add this article to your Mendeley library MendeleyBASE

Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:
Title

Colored semi-transparent Cu-Si oxide thin films prepared by magnetron sputtering

AuthorsGil-Rostra, J. ; Yubero, Francisco ; Fernández, R.; Cotrino, José ; Ortega-Feliú, I. ; González-Elipe, Agustín R.
Issue Date2011
PublisherOptical Society of America
CitationOptical Materials Express 1(6): 1100-1112 (2011)
AbstractColored semi-transparent Cu-Si oxide thin films have been prepared by reactive magnetron sputtering from a single cathode of copper-silicon composition. Thin films of different composition and optical response were obtained by changing process parameters like the relative amount of copper in the target and the O2/Ar mixture of the reactive plasma gas. The film characteristics were analyzed by several techniques. Their optical properties (refractive index, absorption coefficient, color) have been correlated with the process parameters used in the film preparation as well as with the film stoichiometry and chemistry.
Description13 páginas, 11 figuras, 1 tabla.-- et al.
Publisher version (URL)http://dx.doi.org/10.1364/OME.1.001100
URIhttp://hdl.handle.net/10261/56593
DOI10.1364/OME.1.001100
Identifiersdoi: 10.1364/OME.1.001100
issn: 2159-3930
Appears in Collections:(ICMS) Artículos
(CENIM) Artículos
(CNA) Artículos
Files in This Item:
File Description SizeFormat 
23-2011.pdf1,23 MBAdobe PDFThumbnail
View/Open
Show full item record
 

Related articles:


WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.