Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/4887
COMPARTIR / EXPORTAR:
logo share SHARE BASE
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL | DATACITE

Invitar a revisión por pares abierta
Campo DC Valor Lengua/Idioma
dc.contributor.authorGarcía García, Nicolás-
dc.contributor.authorCheng, Hao-
dc.contributor.authorLu, Yonhua-
dc.contributor.authorMuñoz, Manuel-
dc.contributor.authorYifang, Chen-
dc.contributor.authorZhengqi, Lu-
dc.contributor.authorYun, Zhou-
dc.contributor.authorGenhua, Pan-
dc.contributor.authorZheng, Cui-
dc.contributor.authorPasa, A. A.-
dc.date.accessioned2008-06-09T07:47:26Z-
dc.date.available2008-06-09T07:47:26Z-
dc.date.issued2006-07-24-
dc.identifier.citationarXiv:cond-mat/0607608v1 [cond-mat.mtrl-sci]en_US
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10261/4887-
dc.description15 pages, 4 figures. Accepted by APL.-- Final full-text version published 24 Aug 2006, available at: http://dx.doi.org/10.1063/1.2337538en_US
dc.description.abstractIn this paper we show spin dependent transport experiments in nanoconstrictions ranging from 30 to 200nm. These nanoconstrictions were fabricated combining electron beam lithography and thin film deposition techniques. Two types of geometries have been fabricated and investigated. We compare the experimental results with the theoretical estimation of the electrical resistance. Finally we show that the magnetoresistance for the different geometries does not scale with the resistance of the structure and obtain drops in voltage of 20mV at 20 Oe.en_US
dc.description.sponsorshipThis work has been supported by the BMR-NMP-EU project.en_US
dc.format.extent408853 bytes-
dc.format.mimetypeapplication/pdf-
dc.language.isoengen_US
dc.publisherAmerican Institute of Physics-
dc.relation.isversionofPreprint-
dc.rightsopenAccessen_US
dc.subjectMetallic thin filmsen_US
dc.subjectMagnetoresistanceen_US
dc.subjectPermalloyen_US
dc.subjectNanocontactsen_US
dc.subjectElectron beam lithographyen_US
dc.titleMagnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithographyen_US
dc.typepreprinten_US
dc.identifier.doi10.1063/1.2337538-
dc.description.peerreviewedPeer revieweden_US
dc.contributor.funderEuropean Commission-
dc.identifier.funderhttp://dx.doi.org/10.13039/501100000780es_ES
dc.type.coarhttp://purl.org/coar/resource_type/c_816bes_ES
item.languageiso639-1en-
item.fulltextWith Fulltext-
item.openairecristypehttp://purl.org/coar/resource_type/c_816b-
item.cerifentitytypePublications-
item.grantfulltextopen-
item.openairetypepreprint-
Aparece en las colecciones: (LFSPyN) Artículos
Ficheros en este ítem:
Fichero Descripción Tamaño Formato
Magnetoresistance.pdf399,27 kBAdobe PDFVista previa
Visualizar/Abrir
Show simple item record

CORE Recommender

WEB OF SCIENCETM
Citations

10
checked on 23-nov-2021

Page view(s)

451
checked on 23-abr-2024

Download(s)

277
checked on 23-abr-2024

Google ScholarTM

Check

Altmetric

Altmetric


NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.