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Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/4887
Title: Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography
Authors: García García, Nicolás; Cheng, Hao; Lu, Yonhua; Muñoz, Manuel; Yifang, Chen; Zhengqi, Lu; Yun, Zhou; Genhua, Pan; Zheng, Cui; Pasa, A. A.
Keywords: Metallic thin films
Electron beam lithography
Issue Date: 24-Jul-2006
Publisher: American Institute of Physics
Citation: arXiv:cond-mat/0607608v1 [cond-mat.mtrl-sci]
Abstract: In this paper we show spin dependent transport experiments in nanoconstrictions ranging from 30 to 200nm. These nanoconstrictions were fabricated combining electron beam lithography and thin film deposition techniques. Two types of geometries have been fabricated and investigated. We compare the experimental results with the theoretical estimation of the electrical resistance. Finally we show that the magnetoresistance for the different geometries does not scale with the resistance of the structure and obtain drops in voltage of 20mV at 20 Oe.
Description: 15 pages, 4 figures. Accepted by APL.-- Final full-text version published 24 Aug 2006, available at: http://dx.doi.org/10.1063/1.2337538
URI: http://hdl.handle.net/10261/4887
DOI: 10.1063/1.2337538
ISSN: 0003-6951
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