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Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography

AuthorsGarcía García, Nicolás; Cheng, Hao; Lu, Yonhua; Muñoz, Manuel; Yifang, Chen; Zhengqi, Lu; Yun, Zhou; Genhua, Pan; Zheng, Cui; Pasa, A. A.
KeywordsMetallic thin films
Electron beam lithography
Issue Date24-Jul-2006
PublisherAmerican Institute of Physics
CitationarXiv:cond-mat/0607608v1 [cond-mat.mtrl-sci]
AbstractIn this paper we show spin dependent transport experiments in nanoconstrictions ranging from 30 to 200nm. These nanoconstrictions were fabricated combining electron beam lithography and thin film deposition techniques. Two types of geometries have been fabricated and investigated. We compare the experimental results with the theoretical estimation of the electrical resistance. Finally we show that the magnetoresistance for the different geometries does not scale with the resistance of the structure and obtain drops in voltage of 20mV at 20 Oe.
Description15 pages, 4 figures. Accepted by APL.-- Final full-text version published 24 Aug 2006, available at: http://dx.doi.org/10.1063/1.2337538
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