Determination of the fictitious frit temperature by raman spectroscopy

Por favor, use este identificador para citar o enlazar a este item: http://hdl.handle.net/10261/41320

COMPARTIR / EXPORTAR:

SHARE BASE	Comparte tu historia de Acceso Abierto
Visualizar otros formatos: MARC \| Dublin Core \| RDF \| ORE \| MODS \| METS \| DIDL \| DATACITE
Refman EndNote Bibtex RefWorks Excel CSV PDF DataCite Send via email

Título:	Determination of the fictitious frit temperature by raman spectroscopy
Autor:	Rubio Alonso, Juan CSIC ORCID; Tamayo Hernando, Aitana CSIC ORCID CVN; Rubio Alonso, Fausto CSIC ORCID ; Mazo Fernández, María Alejandra CSIC ORCID ; Pérez Villar, Sofía CSIC; Oteo Mazo, José Luis CSIC
Fecha de publicación:	2010
Citación:	QUALICER 2010
Resumen:	The fictitious temperature of a frit and its relationship to surface microhardness was determined. It was observed that both the Si-O-Si bond angle and microhardness decreased with the fictitious temperature, a result attributed to silica phase separation from the rest of the frit components when the frit was heat treated.
Descripción:	4 páginas, 2 figuras.-- Trabajo presentado al 11th World Congress on Ceramic Tile Quality celebrado en Castellón (España) del 15 al 16 de Febrero de 2010.
URI:	http://hdl.handle.net/10261/41320
Aparece en las colecciones:	(ICV) Comunicaciones congresos