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Closed Access item Nanoalignment mask fabricated directly on Si by AFM

Authors:Huang, W.
Dang, X.
Hu, Q.
Tello Ruiz, Marta
Calleja, Montserrat
García García, Ricardo
Gómez-Rodríguez, J. M.
Baró, A. M.
Keywords:Nanopositioning, Mask, Two-dimensional grid, AFM
Issue Date:2001
Publisher:Wiley-Blackwell
Citation:Surface and Interface Analysis 32: 130-132 (2001)
Abstract:The alignment mask with submicrometre and nanometre sensitivity is very important and useful in the microelectronics industry and for nanoscience and technology in the near future. Here we report for the first time a nanoalignment mask that has been fabricated directly on Si by atomic force microscopy.
Publisher version (URL):http://dx.doi.org/10.1002/sia.102
URI:http://hdl.handle.net/10261/35766
ISSN:0142-2421
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Appears in Collections:(IMM-CNM) Artículos

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