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Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/35766
Title: Nanoalignment mask fabricated directly on Si by AFM
Authors: Huang, W.; Dang, X.; Hu, Q.; Tello Ruiz, Marta; Calleja, Montserrat; García García, Ricardo; Gómez-Rodríguez, J. M.; Baró, A. M.
Keywords: Nanopositioning
Two-dimensional grid
Issue Date: 2001
Publisher: Wiley-Blackwell
Citation: Surface and Interface Analysis 32: 130-132 (2001)
Abstract: The alignment mask with submicrometre and nanometre sensitivity is very important and useful in the microelectronics industry and for nanoscience and technology in the near future. Here we report for the first time a nanoalignment mask that has been fabricated directly on Si by atomic force microscopy.
Publisher version (URL): http://dx.doi.org/10.1002/sia.102
URI: http://hdl.handle.net/10261/35766
ISSN: 0142-2421
DOI: 10.1002/sia.1023
Appears in Collections:(IMM-CNM) Artículos
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