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Título: | Large area fabrication method based on the local oxidation of silicon and/or differents materials on Micro- and Nano-Scale |
Autor: | García García, Ricardo CSIC ORCID | Fecha de publicación: | 6-may-2005 | Citación: | International Publication Number: WO 2005/040037 A1 | Resumen: | Process for local oxidation of a surface to be oxidized on micro and nano scale, including: i) the application of a stamp, made of or covered with a conductive material, with motives in relief of sub-micrometer or nanometer size, on or over said surface to be oxidized, in an atmosphere of gas having a controlled content of electrolyte vapours and ii) the application of an electric voltage between the stamp, connected to the negative pole, and the surface to be oxidized, connected to the positive pole. | Descripción: | Filing Date: 2004-10-19. --Priority Data: IT BO2003A000614 (2003-10-20) | URI: | http://hdl.handle.net/10261/3456 |
Aparece en las colecciones: | (IMN-CNM) Patentes |
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WO_2005_040037_A1[1].pdf | 1,43 MB | Adobe PDF | Visualizar/Abrir |
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