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Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/33826
Title: A study of the evolution process of antiphase boundaries in GaAs on Si
Authors: Molina, Sergio I.; Aragón, G.; García, Rafael; González Díez, Yolanda ; González Sotos, Luisa ; Briones Fernández-Pola, Fernando
Keywords: ALMBE
Antiphase boundaries
GaAs on silicon
Issue Date: 1993
Publisher: Springer
Citation: Journal of Electronic Materials 22(5): 565-572 (1993)
Abstract: A study by high resolution electron microscopy and conventional transmission electron microscopy of the process of closure of antiphase boundaries (APB) in atomic layer molecular beam epitaxy (ALMBE) grown GaAs on silicon is reported. A parallelepipedical shape, closed at the top by another boundary with a semispheric shape, is proposed for the during growth suppressed APBs in GaAs epilayers. Antiphase boundaries are mostly located in {100} plans. Sixty degree dislocations are involved in the process of bending of APBs from {110} to {11n} planes; this bending is the initial step which must take place to get a single domain by interaction of two APBs. The proposed shape for closed APBs is in good agreement with the quasi two-dimensional growth observed for GaAs grown on silicon by ALMBE.
Description: 6 páginas.
Publisher version (URL): http://dx.doi.org/10.1007/BF02661632
URI: http://hdl.handle.net/10261/33826
DOI: 10.1007/BF02661632
ISSN: 0361-5235
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