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Título

Giant growth rate in nano-oxidation of p-silicon surfaces by using ethyl alcohol liquid bridges

AutorTello Ruiz, Marta ; García García, Ricardo
Palabras claveOxidation
Organic Compounds
Nanolithography
Atomic Force Microscopy
Water
Silicon
Elemental Semiconductors
Fecha de publicación22-sep-2003
EditorAmerican Institute of Physics
CitaciónApplied Physics Letters 83, 12: 2339-2341 (2003)
ResumenWe demonstrate that local oxidation nanolithography can be performed in liquid environments different from aqueous solutions with a significant improvement in the aspect ratio of the fabricated motives. Here, we perform a comparative study of noncontact atomic force microscopy oxidation experiments in water and ethyl alcohol. The growth rate of local oxides can be increased by almost an order of magnitude by using oxyanions from ethyl alcohol molecules. We propose that the enhanced growth rate is a consequence of the reduction of the trapped charges within the growing oxide. The present results open the possibility of using local oxidation nanolithography to directly fabricate vertical oxide structures while keeping lateral sizes in the nanometer range.
URIhttp://hdl.handle.net/10261/2815
DOI10.1063/1.1613799
ISSN0003-6951
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