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Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/27425
Title: Coercive and anisotropy fields in patterned amorphous FeSi submicrometric structures
Authors: Vélez, M.; Morales, R.; Alameda, J. M.; Briones Fernández-Pola, Fernando ; Martín, J. I.; Vicent, J. L.
Keywords: FeSi
Submicrometric structures”
Issue Date: 1-May-2000
Publisher: American Institute of Physics
Citation: Journal of Applied Physics 87(9) : 5654–5656 (2000)
Abstract: Amorphous FexSi12x films have been prepared on Si substrates in order to fabricate submicrometric magnetic structures with soft magnetic behavior. The magnetic properties compositional dependence of the unpatterned samples has been analyzed to select the Fe content (x50.7) with the lowest coercive and anisotropy fields values. Arrays of Fe0.7Si0.3 lines have been fabricated by electron beam lithography combined with a liftoff technique, with typical dimensions of 200 nm linewidth and 1 mm line spacing. These arrays present coercive fields parallel to the line direction as small as 9 Oe.
Publisher version (URL): http://dx.doi.org/10.1063/1.372479
URI: http://hdl.handle.net/10261/27425
DOI: 10.1063/1.372479
ISSN: 0021-8979
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