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Título : Gallium self-diffusion in gallium phosphide
Autor : Wang, Lei, Volk, A., Hsu, L., Haller, E. E., Erickson, J. W., Cardona, M., Ruf, T., Silveira, Juan Pedro, Briones Fernández-Pola, Fernando
Palabras clave : Gallium compounds
Secondary ion mass spectra
Fecha de publicación : 3-Feb-1997
Editor: American Institute of Physics
Citación : Applied Physics Letters 70(14): 1831-1833 (1997)
Resumen: Ga self-diffusion in gallium phosphide (GaP) is measured directly in isotopically controlled GaP heterostructures. Secondary ion mass spectroscopy (SIMS) is used to monitor intermixing of 69Ga and 71Ga between isotopically pure GaP epilayers which are grown by molecular beam epitaxy (MBE) on GaP substrates. The Ga self-diffusion coefficient in undoped GaP is determined to be D=2.0 cm2 s−1 exp(−4.5 eV/kBT) between 1000 and 1190 °C under phosphorus-rich condition. The self-diffusion entropy is found to be ∼4 kB.
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ISSN: 0003-6951 (Print)
1077-3118 (Online)
DOI: 10.1063/1.118705
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