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Large enhancement of the third-order optical susceptibility in Cu-silica composites produced by low-energy high-current ion implantation

AuthorsOlivares Villegas, José ; Requejo-Isidro, José; Coso López, Raúl del; Nalda, R. de; Solís Céspedes, Javier ; Afonso, Carmen N. ; Stepanov, A. L.; Hole, D.; Townsend, Paul D.; Naudon, A.
Silicon compounds
Nanostructured materials
Composite materials
Issue Date15-Jul-2001
PublisherAmerican Institute of Physics
CitationJournal of Applied Physics 90(2): 1064 (2001)
AbstractLow-energy high-current ion implantation in silica at a well-controlled substrate temperature has been used to produce composites containing a large concentration of spherical Cu clusters with an average diameter of 4 nm and a very narrow size distribution. A very large value for the third-order optical susceptibility, (3) = 10–7 esu, has been measured in the vicinity of the surface plasmon resonance by degenerate four-wave mixing at 585 nm. This value is among the largest values ever reported for Cu nanocomposites. Additionally, the response time of the nonlinearity has been found to be shorter than 2 ps. The superior nonlinear optical response of these implants is discussed in terms of the implantation conditions.
Description3 pages, 3 figures, 1 table.-- PACS: 61.46.+w; 78.67.Bf; 42.65.An; 42.65.Hw; 61.72.Ww; 61.80.Jh; 73.22.Lp
Publisher version (URL)http://dx.doi.org/10.1063/1.1379772
Appears in Collections:(CFMAC-IO) Artículos
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