English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/173792
Share/Impact:
Statistics
logo share SHARE   Add this article to your Mendeley library MendeleyBASE
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:
Title

Lithography tools for patterning at the nanoscale

AuthorsMartín, José Ignacio
Issue Date2017
Citation43rd International Conference on Micro and Nano Engineering (2017)
AbstractIn this talk, we will review tthe variety of litography techniques that allow the patterning of ordered structures at the nanoscale. First, the main characteristics of optical lithography will be described, indicating its different configurations, photoresist types, illuminating sources, the tailoring in the masks, or several etching processes. The focus on techniques using photons will be put on x-ray lithography and laser interference lithography. Then, some of the methods based in mechanical processes will be presented, including focus ion beam lithography and soft lithography. finally, different possibilities of using the tip of a scanning probe microscope for patterning will be discussed and relevant examples of bottom-up methods will be presented.
DescriptionResumen del trabajo presentado a la 43rd International Conference on Micro and Nano Engineering (MNE), celebrada en Braga (Portugal) del 18 al 22 de septiembre de 2017.
URIhttp://hdl.handle.net/10261/173792
Appears in Collections:(CINN) Comunicaciones congresos
Files in This Item:
File Description SizeFormat 
accesoRestringido.pdf15,38 kBAdobe PDFThumbnail
View/Open
Show full item record
Review this work
 


WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.