Por favor, use este identificador para citar o enlazar a este item:
http://hdl.handle.net/10261/173627
COMPARTIR / EXPORTAR:
SHARE CORE BASE | |
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL | DATACITE | |
Título: | Polymer porous thin films obtained by direct spin coating |
Autor: | Álvarez-Fernández, Alberto; Valdés-Bango, F. CSIC; Losada Ambrinos, Raquel; Martín, José Ignacio CSIC ORCID; Vélez, María CSIC ORCID; Alameda, J. M. CSIC; García Alonso, F. J. CSIC | Palabras clave: | Self-assembly Block copolymers Nanostructured porous thin films |
Fecha de publicación: | 2018 | Editor: | Society of Chemical Industry John Wiley & Sons |
Citación: | Polymer International 67(4): 393-398 (2018) | Resumen: | Films of four different nanostructures, namely micelles, filled cylinders, ring-shaped porous nanostructures and hollow cylinders, can be prepared easily in a straightforward and simple way by spin coating onto a silicon plate toluene solutions of poly(styrene-block-4-vinylpyridine) copolymer containing formic acid of increasing concentration. Despite the enormous progress in preparation of porous polymers, most of them require multiple steps. In this sense, this method represents an effort to obtain not only porous thin films but also other bidimensional nanostructures in a very simple way. © 2017 Society of Chemical Industry. | URI: | http://hdl.handle.net/10261/173627 | DOI: | 10.1002/pi.5519 | Identificadores: | doi: 10.1002/pi.5519 e-issn: 1097-0126 issn: 0959-8103 |
Aparece en las colecciones: | (CINN) Artículos |
Ficheros en este ítem:
Fichero | Descripción | Tamaño | Formato | |
---|---|---|---|---|
accesoRestringido.pdf | 15,38 kB | Adobe PDF | Visualizar/Abrir |
CORE Recommender
SCOPUSTM
Citations
13
checked on 12-abr-2024
WEB OF SCIENCETM
Citations
12
checked on 27-feb-2024
Page view(s)
232
checked on 19-abr-2024
Download(s)
76
checked on 19-abr-2024
Google ScholarTM
Check
Altmetric
Altmetric
NOTA: Los ítems de Digital.CSIC están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.