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Título: | Ultra-thin Si overlayers on the TiO2 (1 1 0)-(1 × 2) surface: Growth mode and electronic properties |
Autor: | Abad, José; Rogero, Celia CSIC ORCID; Méndez, Javier CSIC ORCID; López, María Francisca CSIC ORCID ; Martín-Gago, José A. CSIC ORCID ; Román García, Elisa Leonor CSIC | Palabras clave: | Titanium dioxide Silicon Silicon oxide X-ray photoelectron spectroscopy (XPS) Ultraviolet photoelectron spectroscopy (UPS) Electron energy loss spectroscopy (ELS) Low energy electron diffraction (LEED-IV) Scanning tunneling microscopy |
Fecha de publicación: | 1-jul-2006 | Editor: | Elsevier | Citación: | Surface Science 600(13): 2696-2704 (2006) | Resumen: | The growth of thin subnanometric silicon films on TiO2 (1 1 0)-(1 × 2) reconstructed surfaces at room temperature (RT) has been studied in situ by X-ray and ultra-violet photoelectron spectroscopies (XPS and UPS), Auger electron and electron-energy-loss spectroscopies (AES and ELS), quantitative low energy electron diffraction (LEED-IV), and scanning tunneling microscopy (STM). For Si coverage up to one monolayer, a heterogeneous layer is formed. Its composition consists of a mixture of different suboxides SiOx (1 < x ⩽ 2) on top of a further reduced TiO2 surface. Upon Si coverage, the characteristic (1 × 2) LEED pattern from the substrate is completely attenuated, indicating absence of long-range order. Annealing the SiOx overlayer results in the formation of suboxides with different stoichiometry. The LEED pattern recovers the characteristic TiO2 (1 1 0)-(1 × 2) diagram. LEED I–V curves from both, substrate and overlayer, indicate the formation of nanometric sized SiOx clusters. | Versión del editor: | https://doi.org/10.1016/j.susc.2006.04.023 | URI: | http://hdl.handle.net/10261/168525 | DOI: | 10.1016/j.susc.2006.04.023 | ISSN: | 0039-6028 |
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