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Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas
|Authors:||Méndez, Isabel; Gordillo Vázquez, Francisco J. ; Herrero, Víctor J. ; Tanarro, Isabel|
|Publisher:||American Chemical Society|
|Citation:||Journal of Physical Chemistry A 110(18): 6060-6066 (2006)|
|Abstract:||The chemical composition of a low pressure hydrogen DC plasma produced in a hollow cathode discharge has been measured and modelled. The concentrations of H atoms and of H+, H2+ and H3+ ions were determined with a combination of optical spectroscopic and mass spectrometric techniques, over the range of pressures (p∼0.008-0.2 mbar) investigated. The results were rationalized with the help of a zero-order kinetic model. A comparatively high fraction (∼0.1 ± 0.05) of H atoms, indicative of a relatively small wall recombination, was observed. Low ionization degrees (< 10-4) were obtained in all cases. In general, the ionic composition of the plasma was found to be dominated by H3+, except at the lowest pressures, where H2+ was the major ion. The key physicochemical processes determining the plasma composition were identified from the comparison of experimental and model results, and are discussed in the paper.|
|Description:||7 pages, 5 figures, 2 tables.-- Printed version published May 11, 2006.|
|Publisher version (URL):||http://dx.doi.org/10.1021/jp057182+|
|Appears in Collections:||(CFMAC-IEM) Artículos|
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