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Título: | Morphology of the asymmetric iron–silicon interfaces |
Autor: | Badía-Romano, L. CSIC; Rubín, Javier CSIC ORCID; Bartolomé, Fernando CSIC ORCID; Magén, César ; Bartolomé, Juan CSIC ORCID; Varnakov, S. N.; Ovchinnikov, S.; Rubio-Zuazo, J. CSIC ORCID; Castro, Germán R. CSIC ORCID | Palabras clave: | Fe/Si nanolayers Interfaces Fe silicides Compositional depth HAXPES CEMS |
Fecha de publicación: | abr-2015 | Editor: | Elsevier | Citación: | Journal of Alloys and Compounds 627: 136-145 (2015) | Resumen: | A systematic study of the iron–silicon interfaces formed upon preparation of (Fe/Si) multilayers has been performed by combination of modern and powerful techniques. Samples were prepared by thermal evaporation under ultrahigh vacuum onto a Si(1 0 0) substrate. The morphology of these films and their interfaces was studied by a combination of scanning transmission electron microscopy, X-ray reflectivity, angle resolved X-ray photoelectron spectroscopy and hard X-ray photoelectron spectroscopy. The Si-on-Fe interface thickness and roughness were determined to be 1.4(1) nm and 0.6(1) nm, respectively. Moreover, determination of the stable phases formed at both Fe-on-Si and Si-on-Fe interfaces was performed using conversion electron Mössbauer spectroscopy on multilayers with well separated Si-on-Fe and Fe-on-Si interfaces. It is shown that while a fraction of Fe remains as α-Fe, the rest has reacted with Si, forming the paramagnetic c-Fe1−xSi phase and a ferromagnetic Fe rich silicide (DO3 type phase). We conclude that the paramagnetic c-Fe1−xSi silicide sublayer is identical in both Si-on-Fe and Fe-on-Si interfaces, whereas an asymmetry is revealed in the composition of the ferromagnetic silicide sublayer. | Versión del editor: | http://dx.doi.org/10.1016/j.jallcom.2014.12.019 | URI: | http://hdl.handle.net/10261/121257 | DOI: | 10.1016/j.jallcom.2014.12.019 | ISSN: | 0925-8388 | E-ISSN: | 1873-4669 |
Aparece en las colecciones: | (ICMM) Artículos (ICMA) Artículos |
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