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dc.contributor.authorStankiewicz, Jolanta-
dc.contributor.authorVilluendas, Francisco-
dc.contributor.authorLozano, María Pilar-
dc.contributor.authorDíez, Isabel-
dc.date.accessioned2015-07-07T09:52:12Z-
dc.date.available2015-07-07T09:52:12Z-
dc.date.issued2013-
dc.identifierdoi: 10.1063/1.4819177-
dc.identifierissn: 0021-8979-
dc.identifiere-issn: 1089-7550-
dc.identifier.citationJournal of Applied Physics 114(8): 083703 (2013)-
dc.identifier.urihttp://hdl.handle.net/10261/117653-
dc.descriptionUnder the terms of the Creative Commons Attribution 3.0 Unported License.-
dc.description.abstractIndium oxide shows an unusual combination of electrical and optical properties that give rise to a broad range of applications in optoelectronic devices. Here, we report results of structural, x-ray photoelectron spectroscopy, and electrical transport studies of transparent homo-junctions, obtained by sequential growth of polycrystalline thin layers of indium oxide under O2-rich and O2-poor conditions. We find that the growth temperature, which affects significantly film morphology, is critical for the rectifying behavior of the junctions. Only junctions grown at about 350 °C are rectifying. We also find that p-type-like layers have higher concentration of inter-grain oxygen than n-type layers, presumably coming from oxygen-rich deposition conditions and from much larger number of grain boundaries than in n-type layers. We conjecture that the segregation of oxygen ions at grain boundaries is responsible for the formation of inversion layers in O2-rich films and their apparent p-type dc conduction. This mechanism significantly modifies the capacitance-voltage characteristics of the junctions. However, the rectifying mechanism can be accounted for by a space-charge layer at the p-n interface. Such behavior might be important in other polycrystalline thin films with a large number of interface defects at grain boundaries. © 2013 AIP Publishing LLC.-
dc.description.sponsorshipWe acknowledge support from grant MAT2012-38213-C02-01, from the Ministerio de Economía y Competividad of Spain. Additional support from Diputación General de Aragón (DGA-CAMRADS) and from Fondo Social Europeo (FSE) is also acknowledged.-
dc.publisherAmerican Institute of Physics-
dc.relation.isversionofPublisher's version-
dc.rightsopenAccess-
dc.titleIndium oxide thin-film homo-junctions: Morphology and electrical properties-
dc.typeartículo-
dc.identifier.doi10.1063/1.4819177-
dc.relation.publisherversionhttp://dx.doi.org/10.1063/1.4819177-
dc.date.updated2015-07-07T09:52:12Z-
dc.description.versionPeer Reviewed-
dc.language.rfc3066eng-
dc.rights.licensehttp://creativecommons.org/licenses/by/3.0/-
dc.contributor.funderMinisterio de Economía y Competitividad (España)-
dc.contributor.funderDiputación General de Aragón-
dc.contributor.funderEuropean Commission-
dc.relation.csic-
dc.identifier.funderhttp://dx.doi.org/10.13039/501100003329es_ES
dc.identifier.funderhttp://dx.doi.org/10.13039/501100000780es_ES
dc.type.coarhttp://purl.org/coar/resource_type/c_6501es_ES
item.openairetypeartículo-
item.grantfulltextopen-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.fulltextWith Fulltext-
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