English   español  
Please use this identifier to cite or link to this item: http://hdl.handle.net/10261/101034
logo share SHARE   Add this article to your Mendeley library MendeleyBASE
Visualizar otros formatos: MARC | Dublin Core | RDF | ORE | MODS | METS | DIDL
Exportar a otros formatos:

Study on the Influence of Ballistic and Diffusive Deposition Particles on the Evolution of the Surface Morphology of Thin Films

AuthorsÁlvarez, Rafael ; Romero-Gómez, Pablo ; Gil-Rostra, J. ; Palmero, Alberto ; Cotrino, José ; Yubero, Francisco ; González-Elipe, Agustín R.
Issue DateNov-2009
CitationAmerican Vacuum Society 56th International Symposium & Exhibition Lugar: San José (California, EEUU)
AbstractThe influence of ballistic and diffusive particles on the development of the surface morphology of plasma-assisted sputtered thin films is studied [1]. Ballistic particles are sputtered from the cathode and are characterized by their high directionality towards the film surface as well as by typical kinetic energies in the order of 1 eV, whereas thermal diffusive particles follow the Maxwell velocity distribution function, with typical kinetic energies in the order of 0.01 eV [2,3]. These factors influence the role of non-local surface shadowing and the surface sticking probability of the deposition particles, which, along with other fundamental mechanisms, strongly condition the development of the film morphology. In order to carry out this research, a combined theoretical and experimental approach has been followed: on one hand several thin films have been deposited in different experimental conditions which allow differentiating ballistic and diffusive contributions to the film growth, and, on the other hand, we have developed a basic Monte Carlo model of the depositions process. The comparison between experimental and theoretical results provides fundamental understanding about the influence of ballistic and diffusive particles on the development of the thin film nanostructure [4]
DescriptionPresentación oral en el AVS 56th International Symposium & Exhibition
Appears in Collections:(ICMS) Comunicaciones congresos
Files in This Item:
File Description SizeFormat 
AVS 2009 - Abstract.pdf241,1 kBAdobe PDFThumbnail
Show full item record

WARNING: Items in Digital.CSIC are protected by copyright, with all rights reserved, unless otherwise indicated.