| Derechos | Preview | Fecha Public. | Título | Autor(es) | Tipo |
| openAccess |  | 2013 | 2 MeV electron irradiation effects on the electrical characteristics of metal-oxide-silicon capacitors with atomic layer deposited Al<inf>2</inf>O <inf>3</inf>, HfO<inf>2</inf> and nanolaminated dielectrics | Rafí, J. M. CSIC ORCID ; Campabadal, Francesca CSIC ORCID ; Ohyama, H.; Takakura, K.; Tsunoda, I.; Zabala, Miguel; Beldarrain, O.; González, M. B.; García, H.; Castán, H.; Gómez, A.; Dueñas, S. | artículo |
| openAccess |  | 2013 | 2 MeV electron irradiation effects on the electrical characteristics of MOS capacitors with ALD Al<inf>2</inf>O<inf>3</inf> dielectrics of different thickness | Rafí, J. M. CSIC ORCID ; González, M. B.; Takakura, K.; Tsunoda, I.; Yoneoka, M.; Beldarrain, O.; Zabala, Miguel; Campabadal, Francesca CSIC ORCID | artículo |
| closedAccess |  | 9-jun-2014 | Analysis of the temperature dependence of the switching variability in Ni/HfO2-based RRAM devices | González, M. B.; Rafí, J. M. CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Acero Leal, María Cruz CSIC ORCID ; Campabadal, Francesca CSIC ORCID | comunicación de congreso |
| openAccess |  | 28-sep-2015 | Blistering of ALD Al2O3 films in Al-Al2O3-Si structures | Campabadal, Francesca CSIC ORCID ; Acero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Duch, M.; Zabala, Miguel; González, M. B. | póster de congreso |
| openAccess |  | 8-feb-2011 | Comparison between Al2O3 thin films grown by ALD using H2O or O3 as oxidant source | Campabadal, Francesca CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Acero Leal, María Cruz CSIC ORCID ; Rafí, J. M. CSIC ORCID | comunicación de congreso |
| openAccess |  | 2011 | Deposition temperature and thermal annealing effects on the electrical characteristics of atomic layer deposited Al<inf>2</inf>O<inf>3</inf> films on silicon | Rafí, J. M. CSIC ORCID ; Zabala, Miguel; Beldarrain, O.; Campabadal, Francesca CSIC ORCID | artículo |
| openAccess |  | 11-feb-2015 | Effect of the blistering of ALD Al2O3 films on the silicon surface in Al-Al2O3-Si structures | Acero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Duch, M.; Zabala, Miguel; González, M. B.; Campabadal, Francesca CSIC ORCID | póster de congreso |
| openAccess |  | 2013 | Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing | García, H.; Castán, H.; Dueñas, S.; Bailón, L.; Campabadal, Francesca CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; González, M. B.; Rafí, J. M. CSIC ORCID | artículo |
| openAccess |  | 2013 | Impact of electrical stress on the electrical characteristics of 2 MeV electron irradiated metal-oxide-silicon capacitors with atomic layer deposited Al<inf>2</inf>O<inf>3</inf>, HfO<inf>2</inf> and nanolaminated dielectrics | Rafí, J. M. CSIC ORCID ; González, M. B.; Takakura, K.; Tsunoda, I.; Yoneoka, M.; Beldarrain, O.; Zabala, Miguel; Campabadal, Francesca CSIC ORCID | artículo |
| openAccess | | 11-feb-2015 | Investigation of the resistive switching behavior in Ni/HfO2-based RRAM devices | González, M. B.; Acero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Campabadal, Francesca CSIC ORCID | comunicación de congreso |
| openAccess | | 19-sep-2011 | Ultra-thin ALD layers of HfO2 for silicon micromachining | Duch, M.; Gerbolés, Marta; Acero Leal, María Cruz CSIC ORCID ; Beldarrain, O.; Zabala, Miguel; Campabadal, Francesca CSIC ORCID | póster de congreso |
